Semiconductors Supply Chain
EUV Mask Blanks
Fab Materials
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EUV Mask Blanks
Ultra-flat low-thermal-expansion substrates with multilayer reflective coatings, the blank a photomask is written on. Hoya + AGC (both JP) ~93% duopoly — a single-country chokepoint, which is why this branch expands one level past photomasks (Jul 16 decision Q5).
Suppliers
2
CLEAR
2
CAUTION
0
FLAGGED
0
BLOCKED
0
Process flow
Upstream inputs
None: first stage.
Downstream outputs
Suppliers at this stage
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